Semiconductor
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Silver etching solution

Product Introduction

It is used to etch only the silver metal surface under the nitric acid system. It is used in the silver surface treatment process. It has selective etching performance compared to nickel and titanium metals and does not damage the photoresist during the etching process.

Operation suggestions

Operating parameters Immersion work
Single dose medicine Use directly by soaking
Operating temperature (℃) 20~30
Etching speed 130~140 Å/sec
Nickel metal corrosion rate 0.1~1 Å/sec
Titanium metal corrosion rate < 0.1 Å/sec
Achievements
銀蝕刻液成果
銀蝕刻液成果2

E-CHEM Taiwan Main Office
陳相穎 Lana Chen
Tel:+886-3-3653300 #4207
M.P:+886- 978513605
E-mail:lana.chen@echemsemi.com

E-CHEM Shanghai Corp Dongguan Office
徐世綱 Kenny Hsu
Tel:+886-3-3653300 #4203
M.P:+886- 88213093
E-mail:kenny.hsu@echemsemi.com