AluminaSlurry CMP Slurry

Product Introduction

Composed of high-purity nanoscale aluminum oxide powder, it is suitable for polishing silicon wafers, quartz crystals, sapphire, indium phosphide, gallium arsenide, niobium lithium oxide, niobium tantalate, alloy metal... components, and can comply with Different processes include thinning, edge polishing, coarse polishing, medium polishing, fine polishing and mirror polishing.

Product Specifications

For detailed information,please contact our company's sales personnel

E-CHEM Taiwan Main Office
陳相穎 Lana Chen
Tel:+886-3-3653300 #4207
M.P:+886- 978513605
E-mail:lana.chen@echemsemi.com