SPH series
Due to its special microporous structure, this product has good retention of polishing fluid. At the same time, due to the moderate rigidity of the polishing pad and good polishing reproducibility, it can improve the stability and dimensional precision of the process. This product has the advantages of high removal rate, high flatness, low defectivity and high cost performance. Our company has a variety of soft polishing pads with different hardnesses to meet the different needs of customers. They can be used for polishing various III-V compound semiconductor materials, IC manufacturing, metal, quartz, glass, photomasks, hard disks and other materials.
- SPH-90 It can be provided with or without grooves, and its performance is mainly similar to the general-purpose soft polishing pads of R factory or D factory. Customers do not need to modify the recipe on a large scale for introduction and use.
- SPH-70 It has the excellent characteristics of high grinding rate, high profile stability, low defects and less scratches.
SPH series
Due to the special microporous structure, this series of products has good retention of the polishing fluid. At the same time, the polishing pad has moderate rigidity and good polishing reproducibility, which can improve the stability and dimensional precision of the process. IT series products have the advantages of high removal rate, high flatness, low defectivity and high cost performance. Our company has a variety of hard polishing pads with different hardnesses to meet the different needs of customers. They can be used for surface polishing of various glass, optical lenses, ceramics, quartz, metals, and semiconductor materials.
- SPM-80AA Compared with the commonly used SUBA-800 in the industry, the results are equivalent to RR, SFQR, Particle, Scratch, TTV, STIR and other data.
- In the marathon test, the grinding rate of SPM-80AA and SUBA-800 remained stable.
