Silicon Slurry CMP Slurry

Product Introduction

Composed of high-purity colloidal silicon oxide particles (colloidal silica), it is suitable for polishing silicon wafers, quartz crystals, sapphire, niobium lithium oxide, niobium tantalate, alloy metal... components, and can be used for thinning, Side polishing, coarse polishing, medium polishing, fine polishing and mirror polishing needs.

Product Specifications

For detailed information, please contact our company's sales personnel

E-CHEM Taiwan Main Office
陳相穎 Lana Chen
Tel:+886-3-3653300 #4207
M.P:+886- 978513605
E-mail:lana.chen@echemsemi.com