Precursors 前驅體、前驅物、先質

From synthesis, formulation, polymerization to application of Nano-Materials. Due to the outstanding performance in Semi- Nanmat CVD. Market share are the Top tier in Taiwan and challenge No 1.

CVD Precursors:

南美特提供半導體客戶優質之化學氣相沉積材料(CVD/ALD Precursors),包含最先進之 high k 及 low k dielectrics 材料,並配合其需求進行客製化合成,純化及包裝,以提高其製程良率。

應用 產品名稱
Dielectrics PMD / IMD TEOS / TEPO / TMPO / TEB / TMB
Low K Dielectrics 4MS / OMCTS / DMDMOS
High K Dielectrics TAETO (Ta2O5 Precursor )
TEMAH / HfCl4 (ALD HfO2 Precursor )
TEMAZ (ALD ZrO2 Precursor)
TMA (Al2O3 Precursor)
Metal Gate and Interconnect Metal TDMAT ( TiN Precursor )
TiCl4 ( Ti /TiN Precursor )
PDMAT ( TaN Precursor)
CCTBA (Co Precursor )
TMA ( Al Precursor )
Low-Temp Nitride / Oxide HCDS / 3DMAS / BTBAS
Dopants Trans DCE
SAM Coating FDTS / BTCSE / DI Water
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