簡介 (Introduction)
From synthesis, formulation, polymerization to application of Nano-Materials. Due to the outstanding performance in Semi- Nanmat CVD. Market share are the Top tier in Taiwan and challenge No 1.
CVD Precursors
南美特提供半導體客戶優質之化學氣相沉積材料（CVD/ALD Precursors)，包含最先進之 high k 及 low k dielectrics 材料，並配合其需求進行客製化合成，純化及包裝，以提高其製程良率。
應用 |
產品名稱 |
Dielectrics PMD / IMD |
• TEOS / TEPO / TMPO / TEB / TMB |
Low K Dielectrics |
• 4MS / OMCTS / DMDMOS
|
High K Dielectrics |
• TAETO (Ta2O5 Precursor )
• TEMAH / HfCl4 (ALD HfO2 Precursor )
• TEMAZ (ALD ZrO2 Precursor)
• TMA (Al2O3 Precursor)
|
Metal Gate and Interconnect Metal |
• TDMAT ( TiN Precursor )
• TiCl4 ( Ti /TiN Precursor )
• PDMAT ( TaN Precursor)
• CCTBA (Co Precursor )
• TMA ( Al Precursor ) |
Low-Temp Nitride / Oxide |
• HCDS / 3DMAS / BTBAS |
Dopants |
• Trans DCE |
SAM Coating |
• FDTS / BTCSE / DI Water |
包材 (Package)
