From synthesis, formulation, polymerization to application of Nano-Materials. Due to the outstanding performance in Semi- Nanmat CVD. Market share are the Top tier in Taiwan and challenge No 1.
CVD Precursors:
南美特提供半導體客戶優質之化學氣相沉積材料(CVD/ALD Precursors),包含最先進之 high k 及 low k dielectrics 材料,並配合其需求進行客製化合成,純化及包裝,以提高其製程良率。
| 應用 | 產品名稱 |
|---|---|
| Dielectrics PMD / IMD | TEOS / TEPO / TMPO / TEB / TMB |
| Low K Dielectrics | 4MS / OMCTS / DMDMOS |
| High K Dielectrics | TAETO (Ta2O5 Precursor ) TEMAH / HfCl4 (ALD HfO2 Precursor ) TEMAZ (ALD ZrO2 Precursor) TMA (Al2O3 Precursor) |
| Metal Gate and Interconnect Metal | TDMAT ( TiN Precursor ) TiCl4 ( Ti /TiN Precursor ) PDMAT ( TaN Precursor) CCTBA (Co Precursor ) TMA ( Al Precursor ) |
| Low-Temp Nitride / Oxide | HCDS / 3DMAS / BTBAS |
| Dopants | Trans DCE |
| SAM Coating | FDTS / BTCSE / DI Water |